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Photosensitive Phenolic Epoxy Acrylic Resin

Jun 27, 2020

Industry news: epoxy resin has excellent solvent resistance, acid and alkali resistance, excellent adhesion to metals, good thermal stability and electrical insulation Sex, color retention, etc., still occupy an irreplaceable position in the automotive industry, electrical industry, aviation industry and cutting-edge industry. However, epoxy resins have no photochemical activity, which limits the application of epoxy resins. The F-44 epoxy resin was modified to synthesize a photosensitive phenolic epoxy resin containing both epoxy groups and acrylic groups. The modified resin not only retains the advantages of general F-type epoxy resins, but also The introduction of photosensitive groups brings convenience to the application of modified F-44 resin and expands the application field. This article further discusses the production process of photosensitive phenolic epoxy acrylic resin, with a view to finding a cheap, safe and non-toxic catalyst to replace the expensive quaternary ammonium bromide, so as to reduce production costs and optimize the production process. Using acrylic and F-44 epoxy resin as raw materials, a photosensitive phenolic epoxy acrylate resin containing both epoxy groups and acrylic groups was synthesized. The effects of catalyst type, catalyst dosage, reaction time and reaction temperature on the conversion of acrylic acid were studied. As a result, it was found that triethylamine was used as the catalyst, the reaction temperature was 95℃, the amount of the catalyst was 2% of the resin mass, the esterification reaction was completed within 6h, and the coating film made of the synthesized resin had excellent mechanical properties and solvent resistance And acid and alkali resistance. The structure of the synthesized resin was characterized by FT-IR.

      1. Main raw materials

F-44 epoxy resin (epoxy value 0.44): domestic; dioxane (dioxane): analytically pure, Shanghai No. 3 Reagent Factory; hydroquinone: chemically pure, Chongqing Electronic Material Reagent Factory; ethyl-pair -Dimethylamino benzoate (EDAB) photosensitizer, isopropyl thioxanthone (ITX) photosensitizer: supplied by the United States Baker International Co., Ltd.; trimethylolpropyl triacrylate (TMPTA) Coupling agent: provided by UCB Chemical Company, Belgium; acrylic acid: chemically pure, Shanghai Wulian Reagent Chemical Factory; maleic anhydride: analytically pure, Tianjin Chemical Reagent Factory No.1.

       2. Main instruments

The infrared spectrum of the sample was measured by the IMPACT420 Fourier infrared spectrometer produced by NICOLET Instruments; the photochemical activity of the product was exposed by a self-made ultraviolet light exposure instrument. According to the introduction of experts, the change of double bond content before and after exposure was measured by the above infrared spectrometer. The power of the ultraviolet lamp is 1000W, the distance between the lamp tube and the sample is 26cm; the adhesion of the coating film is determined by the QFZ-Ⅱ type paint film adhesion tester produced by the original Tianjin Material Experiment Machine Factory.